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关于美国德克萨斯A&M大学孙国荣博士学术报告的通知
2017-06-28 10:54:41     (点击: )

报告题目:AdvancedPhotoresist Technologies by Intricate Molecular Brush Architectures

报告人:Dr.Guorong Sun (Senior Scientist, Department of Chemistry, Texas A&M University, USA)

报告时间:2017年6月30日(周五)上午10:00 – 11:00

报告地点:19号楼226学术报告厅

   报告人简介:

   GuorongSun received his Ph.D. in polymer chemistry in 2009 from Washington Universityin Saint Louis under the direction of Professor Karen L. Wooley, working onsyntheses and chemoselective modifications of cross-linked polymericnanostructure as imaging and delivery agents. He continued his postdoctoraltraining with Professor Wooley at Texas A&M University, where he presentlyis a senior scientist in the Wooley group. His current research focuses onthe exploration of advanced nanomedical materials for imaging-guided cancertherapy and molecular brush-based materials for the microelectronics industry.  

 

 
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