报告题目：AdvancedPhotoresist Technologies by Intricate Molecular Brush Architectures
报告人：Dr.Guorong Sun (Senior Scientist, Department of Chemistry, Texas A&M University, USA)
报告时间：2017年6月30日(周五)上午10：00 – 11：00
GuorongSun received his Ph.D. in polymer chemistry in 2009 from Washington Universityin Saint Louis under the direction of Professor Karen L. Wooley, working onsyntheses and chemoselective modifications of cross-linked polymericnanostructure as imaging and delivery agents. He continued his postdoctoraltraining with Professor Wooley at Texas A&M University, where he presentlyis a senior scientist in the Wooley group. His current research focuses onthe exploration of advanced nanomedical materials for imaging-guided cancertherapy and molecular brush-based materials for the microelectronics industry.